AUSSL has several standard and specialty surface science techniques that address a variety of surface and thin film phenomena.   Three Kratos XSAM 800 surface analytical systems with Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS) and ion scattering (ISS) enables the study of interfaces with sub-monolayer sensitivity.  The dynamics of surface chemical reactions is probed by scanning kinetic spectroscopy (SKS), thermal desorption techniques (TPD), and electron-stimulated desorption (ESD).  Rutherford backscattering spectroscopy (RBS) and light ion channeling enable non-destructive and quantitative materials analysis of layered materials.

Characterization of transport properties and microstructures is carried out by optical (Nomarski and stereo) microscopy and scanning electron microscopy (SEM), Hall effect equipment, current-voltage (I-V), and capacitance-voltage (CV) measurements.

Photolithography and thin film deposition equipment enable the manufacture of circuit test structures, ohmic, and Schottky barrier contacts.

Our chemical vapor deposition system has a low-pressure, vertical reactor design with a 15kW RF induction power supply that can heat a substrate up to 1800 C.  The reactor is used to grow epitaxial wide-bandgap semiconductors and has the capability to handle both liquid and gas metallorganic precursors.

A brief description of our major techniques . . .